Capacitor with extended surface lands and method of fabrication therefor
A Standard patent application filed on 27 November 2001 credited to Figueroa, David ; Walk, Michael J. ; Rodriguez, Jorge P. ; Do, Huong

Details

Application number :

2002217954  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Capacitor with extended surface lands and method of fabrication therefor  

Inventor :

Figueroa, David ; Walk, Michael J. ; Rodriguez, Jorge P. ; Do, Huong  

Agent name :

 

Address for service :

 

Filing date :

27 November 2001  

Associated companies :

 

Applicant name :

Intel Corporation  

Applicant address :

 

Old name :

 

Original Source :

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