Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
A Standard patent application filed on 22 August 2001 credited to Ehrich, Horst ; Shi, Yu ; Rule, Mark

Details

Application number :

2001285247  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same  

Inventor :

Ehrich, Horst ; Shi, Yu ; Rule, Mark  

Agent name :

 

Address for service :

 

Filing date :

22 August 2001  

Associated companies :

 

Applicant name :

The Coca Cola Company  

Applicant address :

 

Old name :

 

Original Source :

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