Epitaxial siox barrier/insulation layer______________________
A Standard patent application filed on 14 June 2001 credited to Wang, Chia-Gee ; Tsu, Raphael ; Lofgren, John Clay

Details

Application number :

2001267090  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Epitaxial siox barrier/insulation layer______________________  

Inventor :

Wang, Chia-Gee ; Tsu, Raphael ; Lofgren, John Clay  

Agent name :

 

Address for service :

 

Filing date :

14 June 2001  

Associated companies :

 

Applicant name :

NANODYNAMICS, INC.  

Applicant address :

510 E. 73rd Street, New York, NY 10021  

Old name :

 

Original Source :

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