A process and apparatus for plasma activated deposition in vacuum
A Standard patent application filed on 23 May 2001 credited to Hass, Derek ; Mattausch, Goesta ; Schiller, Siegfried ; Morgner, Henry ; Groves, James F. ; Wadley, Haydn N. G.

Details

Application number :

2001264866  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

A process and apparatus for plasma activated deposition in vacuum  

Inventor :

Hass, Derek ; Mattausch, Goesta ; Schiller, Siegfried ; Morgner, Henry ; Groves, James F. ; Wadley, Haydn N. G.  

Agent name :

 

Address for service :

 

Filing date :

23 May 2001  

Associated companies :

 

Applicant name :

University of Virginia Patent Foundation  

Applicant address :

 

Old name :

 

Original Source :

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