System and method for pneumatic diaphragm cmp head having separate retaining ring and multi-region wafer pressure control
A Standard patent application filed on 11 May 2001 credited to Reyes, Alejandro ; Hansen, David A. ; Kajiwara, Jiro ; Wang, Huey-Ming ; Moloney, Gerard S.

Details

Application number :

2001259745  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

System and method for pneumatic diaphragm cmp head having separate retaining ring and multi-region wafer pressure control  

Inventor :

Reyes, Alejandro ; Hansen, David A. ; Kajiwara, Jiro ; Wang, Huey-Ming ; Moloney, Gerard S.  

Agent name :

 

Address for service :

 

Filing date :

11 May 2001  

Associated companies :

 

Applicant name :

Multi-Planar Technologies, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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