Measuring plasma uniformity in-situ at wafer level
A Standard patent application filed on 04 May 2001 credited to Johnson, Wayne L. ; Long, Maolin

Details

Application number :

2001259055  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Measuring plasma uniformity in-situ at wafer level  

Inventor :

Johnson, Wayne L. ; Long, Maolin  

Agent name :

 

Address for service :

 

Filing date :

04 May 2001  

Associated companies :

 

Applicant name :

Tokyo electron Limited  

Applicant address :

 

Old name :

 

Original Source :

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