A chemical-mechanical polishing system for the manufacture of semiconductor devices
A Standard patent application filed on 06 April 2001 credited to Vanell, James F. ; Bray, Chad B.

Details

Application number :

2001253180  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

A chemical-mechanical polishing system for the manufacture of semiconductor devices  

Inventor :

Vanell, James F. ; Bray, Chad B.  

Agent name :

 

Address for service :

 

Filing date :

06 April 2001  

Associated companies :

 

Applicant name :

Motorola, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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